发明授权
- 专利标题: Oxide superconductor thick film and method for manufacturing the same
- 专利标题(中): 氧化物超导体厚膜及其制造方法
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申请号: US11549873申请日: 2006-10-16
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公开(公告)号: US07683009B2公开(公告)日: 2010-03-23
- 发明人: Masahiro Kojima , Masakazu Kawahara , Michiharu Ichikawa , Hiroyuki Kado , Masatoyo Shibuya
- 申请人: Masahiro Kojima , Masakazu Kawahara , Michiharu Ichikawa , Hiroyuki Kado , Masatoyo Shibuya
- 申请人地址: JP Yokosuka-shi JP Tokyo
- 专利权人: Central Research Institute of Electric Power Industry,DOWA Electronics Materials Co., Ltd.
- 当前专利权人: Central Research Institute of Electric Power Industry,DOWA Electronics Materials Co., Ltd.
- 当前专利权人地址: JP Yokosuka-shi JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2002-354309 20021205
- 主分类号: H01L39/24
- IPC分类号: H01L39/24
摘要:
The present invention provides a Bi2223 based thick film that does not peel off when a thermal or a mechanical shock is applied to a base or an oxide superconductor thick film or the like in the middle of a manufacturing process and a method of manufacturing the same. An oxide superconductor paste 1 having a mixing ratio of Bi2212 composition is applied to a base 3, dried, burned, and thereafter burned at a temperature approximate to its melting point to obtain a partially molten layer 4. Next, an oxide superconductor paste 2 having a mixing ratio of Bi2223 composition is applied to the partially molten layer 4, dried, burned, compressed by a CIP, and thereafter repeatedly burned and compressed for a predetermined number of times to obtain the base 3 having a desired superconductor thick film 5 formed thereon.
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