发明授权
US07683152B2 Partial block polyimide-polysiloxane copolymer, making method, and resin composition comprising the copolymer
有权
部分嵌段聚酰亚胺 - 聚硅氧烷共聚物，制造方法和包含该共聚物的树脂组合物
- 专利标题： Partial block polyimide-polysiloxane copolymer, making method, and resin composition comprising the copolymer
- 专利标题（中）： 部分嵌段聚酰亚胺 - 聚硅氧烷共聚物，制造方法和包含该共聚物的树脂组合物
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申请号： US11131197申请日： 2005-05-18
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公开(公告)号： US07683152B2公开(公告)日： 2010-03-23
- 发明人: Hideki Akiba , Nobuhiro Ichiroku , Toshio Shiobara
- 申请人： Hideki Akiba , Nobuhiro Ichiroku , Toshio Shiobara
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2004-151486 20040521
- 主分类号： C08G77/24
- IPC分类号： C08G77/24
摘要：
A partial block polyimide-polysiloxane copolymer is provided comprising repeat unit structures having structural formulae (1) and (2) wherein X is an aromatic or aliphatic ring-containing tetravalent organic radical, Y1 is a diamine residue, Y2 is a diaminosiloxane residue, Y1 and Y2 are contained in the copolymer in amounts of 99-20 mol % and 1-80 mol %, respectively, L and m each are an integer of 2-50. The copolymer has good adhesion to substrates, moisture-proof reliability and a low modulus of elasticity.