发明授权
- 专利标题: Fluorine-containing polyether phosphonic acid ester compound and process for producing the same
- 专利标题(中): 含氟聚醚膦酸酯化合物及其制造方法
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申请号: US11791310申请日: 2005-11-24
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公开(公告)号: US07683199B2公开(公告)日: 2010-03-23
- 发明人: Seiichiro Murata , Hideki Abe , Keisuke Kokin
- 申请人: Seiichiro Murata , Hideki Abe , Keisuke Kokin
- 申请人地址: JP Tokyo
- 专利权人: Unimatec Co., Ltd.
- 当前专利权人: Unimatec Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Brinks Hofer Gilson & Lione
- 优先权: JP2004-339858 20041125
- 国际申请: PCT/JP2005/021525 WO 20051124
- 国际公布: WO2006/057272 WO 20060601
- 主分类号: C07F9/02
- IPC分类号: C07F9/02
摘要:
A fluorine-containing polyether phosphonic acid ester compound represented by the following general formula: (R2O)(R1O)P(O)(CH2)aCF(CF3)[OCF2CF(CF3)]bO(CF2)CO[CF(CF3)CF2O]dCF(CF3)(CH2)eP(O)(OR3)(OR4) (where R1, R2, R3 and R4 are hydrogen atoms, alkyl groups, cycloalkyl groups, aryl groups, alkylaryl groups, aralkyl groups, or any of the foregoing groups substituted with halogen atoms, and subscripts a, b, c, d, and e are in conditions of 2≦a+e≦8, b+d≦28, and 1≦c≦10, and subscripts b and d may be 0). The fluorine-containing polyether phosphonic acid ester compound is produced by reaction of a fluorine-containing polyether dialkyl halide represented by the following general formula: X(CH2)aCF(CF3)[OCF2CF(CF3)]bO(CF2)cO[CF(CF3)CF2O]dCF(CF3)(CH2)eX (X: Cl, Br or I)with a phosphite compound represented by the following general formula: (R1O)(R2O)P(OR) and/or (R3O)(R4O)P(OR) (R: a hydrogen atom or a lower alkyl group).
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