发明授权
- 专利标题: Gas radiation oven range
- 专利标题(中): 燃气辐射炉范围
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申请号: US10536395申请日: 2002-11-29
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公开(公告)号: US07690374B2公开(公告)日: 2010-04-06
- 发明人: Dae-Rae Lee , In-Gyu Kim , Dae-Hee Jung , Sug-Moon Choung , Yang Ho Kim
- 申请人: Dae-Rae Lee , In-Gyu Kim , Dae-Hee Jung , Sug-Moon Choung , Yang Ho Kim
- 申请人地址: KR Seoul
- 专利权人: LG Electronics Inc.
- 当前专利权人: LG Electronics Inc.
- 当前专利权人地址: KR Seoul
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 国际申请: PCT/KR02/02245 WO 20021129
- 国际公布: WO2004/051145 WO 20040617
- 主分类号: F24C3/00
- IPC分类号: F24C3/00
摘要:
A gas radiation oven range including an outer case (10) which is formed with an upper side opened, having an internal space, a ceramic glass (20) which is covered and combined with an upper end of the outer case (10), a plurality of burner housings (300) which are combined to be contacted with a lower surface of the ceramic glass (20), forms an exhaust passage (F) with the lower surface of the ceramic glass (20), and is integrally combined with a plurality of ports with different sizes, a radiant burner (40) which is combined with a side surface of the respective burner housings (300), for generating a radiant wave, combusting mixed gas and a shared discharge unit which is positioned among the burner housings (300) and combined to be connected to respective exhaust passages (F) which are formed at a side portion of the burner housings (300).
公开/授权文献
- US20060048767A1 Gas radiation oven range 公开/授权日:2006-03-09
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