Invention Grant
- Patent Title: Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same
- Patent Title (中): 图案转印模具,图案转印装置和使用其的装置制造方法
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Application No.: US11364631Application Date: 2006-02-27
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Publication No.: US07690912B2Publication Date: 2010-04-06
- Inventor: Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
- Applicant: Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2005-055097 20050228
- Main IPC: B29C33/44
- IPC: B29C33/44 ; B29C35/08

Abstract:
One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
Public/Granted literature
- US20060192320A1 Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same Public/Granted day:2006-08-31
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