发明授权
- 专利标题: Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same
- 专利标题(中): 图案转印模具,图案转印装置和使用其的装置制造方法
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申请号: US11364631申请日: 2006-02-27
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公开(公告)号: US07690912B2公开(公告)日: 2010-04-06
- 发明人: Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
- 申请人: Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Takashi Nakamura
- 申请人地址: JP
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP
- 代理机构: Rossi, Kimms & McDowell LLP
- 优先权: JP2005-055097 20050228
- 主分类号: B29C33/44
- IPC分类号: B29C33/44 ; B29C35/08
摘要:
One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.
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