发明授权
- 专利标题: Method for producing trichlorosilane
- 专利标题(中): 制备三氯硅烷的方法
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申请号: US12190151申请日: 2008-08-12
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公开(公告)号: US07691356B2公开(公告)日: 2010-04-06
- 发明人: Takaaki Shimizu , Kyoji Oguro
- 申请人: Takaaki Shimizu , Kyoji Oguro
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-229857 20070905
- 主分类号: C01B33/08
- IPC分类号: C01B33/08 ; C07F7/00
摘要:
A by-product mixture produced in a process for producing polycrystalline silicon is made to react with chlorine to form tetrachlorosilane (STC) distillate in a chlorination reaction vessel, and the tetrachlorosilane (STC) distillate is made to react with hydrogen in a hydrogenation reaction vessel to be converted into trichlorosilane (TCS). In the chlorination step, methyl chlorosilanes having boiling points close to TCS are hyper-chlorinated to be converted into hyper-chlorinated methyl chlorosilanes having higher boiling points, which facilitates the hyper-chlorinated methyl chlorosilanes to be separated into high concentration, and inhibits carbon from contaminating the polycrystalline silicon. A donor/acceptor eliminator is provided in the circulation cycle for producing TCS, and accordingly there is no need to take out a by-product produced in the process for producing TCS to the outside of the system, which can highly purify the TCS.
公开/授权文献
- US20090060817A1 METHOD FOR PRODUCING TRICHLOROSILANE 公开/授权日:2009-03-05