Invention Grant
- Patent Title: System and method for optical power management
- Patent Title (中): 光功率管理系统和方法
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Application No.: US11693277Application Date: 2007-03-29
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Publication No.: US07692785B2Publication Date: 2010-04-06
- Inventor: Willam Scott Sutherland , Anis Zribi , Long Que , Glenn Scott Claydon , Stacey Joy Kennerly , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar Chandrasekaran , David Cecil Hays , Victor Samper , Dirk Lange , Marko Baller , Min-Yi Shih , Sandip Maity
- Applicant: Willam Scott Sutherland , Anis Zribi , Long Que , Glenn Scott Claydon , Stacey Joy Kennerly , Ayan Banerjee , Shivappa Ningappa Goravar , Shankar Chandrasekaran , David Cecil Hays , Victor Samper , Dirk Lange , Marko Baller , Min-Yi Shih , Sandip Maity
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Joseph J. Christian
- Main IPC: G01J3/44
- IPC: G01J3/44

Abstract:
A system and method for managing optical power for controlling thermal alteration of a sample undergoing spectroscopic analysis is provided. The system includes a moveable laser beam generator for irradiating the sample and a beam shaping device for moving and shaping the laser beam to prevent thermal overload or build up in the sample. The moveable laser beam generator includes at least one beam shaping device selected from the group consisting of at least one optical lens, at least one optical diffractor, at least one optical path difference modulator, at least one moveable mirror, at least one Micro-Electro-Mechanical Systems (MEMS) integrated circuit (IC), and/or a liquid droplet. The system also includes an at least two degree of freedom (2 DOF) moveable substrate platform and a controller for controlling the laser beam generator and the substrate platform, and for analyzing light reflected from the sample.
Public/Granted literature
- US20080239306A1 SYSTEM AND METHOD FOR OPTICAL POWER MANAGEMENT Public/Granted day:2008-10-02
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