发明授权
- 专利标题: Method of manufacturing vertical gallium-nitride based light emitting diode
- 专利标题(中): 制造垂直氮化镓基发光二极管的方法
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申请号: US12406540申请日: 2009-03-18
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公开(公告)号: US07695989B2公开(公告)日: 2010-04-13
- 发明人: Doo Go Baik , Bang Won Oh , Seok Beom Choi , Su Yeol Lee
- 申请人: Doo Go Baik , Bang Won Oh , Seok Beom Choi , Su Yeol Lee
- 申请人地址: KR Gyunggi-do
- 专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人: Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人地址: KR Gyunggi-do
- 代理机构: McDermott Will & Emery LLP
- 优先权: KR10-2005-0117958 20051206
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A vertical GaN-based LED and a method of manufacturing the same are provided. The vertical GaN-based LED can prevent the damage of an n-type GaN layer contacting an n-type electrode, thereby stably securing the contact resistance of the n-electrode. The vertical GaN-based LED includes: a support layer; a p-electrode formed on the support layer; a p-type GaN layer formed on the p-electrode; an active layer formed on the p-type GaN layer; an n-type GaN layer for an n-type electrode contact, formed on the active layer; an etch stop layer formed on the n-type GaN layer to expose a portion of the n-type GaN layer; and an n-electrode formed on the n-type GaN layer exposed by the etch stop layer.
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