发明授权
- 专利标题： Radiation system and lithographic apparatus
- 专利标题（中）： 辐射系统和光刻设备
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申请号： US11637937申请日： 2006-12-13
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公开(公告)号： US07696493B2公开(公告)日： 2010-04-13
- 发明人: Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
- 申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
公开/授权文献
- US20080142741A1 Radiation system and lithographic apparatus 公开/授权日：2008-06-19