发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11636586申请日: 2006-12-11
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公开(公告)号: US07697116B2公开(公告)日: 2010-04-13
- 发明人: Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- 申请人: Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 优先权: EP02251933 20020318
- 主分类号: G03B27/72
- IPC分类号: G03B27/72
摘要:
A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.
公开/授权文献
- US20070115449A1 Lithographic apparatus and device manufacturing method 公开/授权日:2007-05-24