发明授权
US07699932B2 Reactors, systems and methods for depositing thin films onto microfeature workpieces
有权
将薄膜沉积在微型工件上的反应器,系统和方法
- 专利标题: Reactors, systems and methods for depositing thin films onto microfeature workpieces
- 专利标题(中): 将薄膜沉积在微型工件上的反应器,系统和方法
-
申请号: US10859883申请日: 2004-06-02
-
公开(公告)号: US07699932B2公开(公告)日: 2010-04-20
- 发明人: Matthew W. Miller , Cem Basceri
- 申请人: Matthew W. Miller , Cem Basceri
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Perkins Coie LLP
- 主分类号: C23C16/00
- IPC分类号: C23C16/00 ; C23C16/455 ; C23C16/458 ; H01L21/306
摘要:
A reactor, system including reactors, and methods for depositing thin films on microfeature workpieces comprising a reaction vessel having a chamber, a gas distributor attached to the reaction vessel, a workpiece holder in the chamber, and a side unit in the reaction vessel at a location relative to the gas distributor and/or the workpiece holder. The gas distributor has a plurality of primary outlets open to the chamber, and the workpiece holder has a process site aligned with the primary outlets. The side unit has a secondary outlet open to the chamber that operates independently of the primary outlets. One of the inner compartment, the side unit and/or the workpiece holder can be movable between a first position to form a small-volume cell for introducing the reactant gases to the microfeature workpiece and a second position to form a large volume space for purging the reactant gases.
公开/授权文献
信息查询
IPC分类: