发明授权
- 专利标题： Method and apparatus for modulation of precursor exposure during a pulsed deposition process
- 专利标题（中）： 在脉冲沉积过程中调制前体曝光的方法和装置
-
申请号： US10821092申请日： 2004-04-08
-
公开(公告)号： US07700155B1公开(公告)日： 2010-04-20
- 发明人: Francisco Juarez , Dennis Hausmann , Bunsen Nie , Teresa Pong , Adrianne Tipton , Patrick Van Cleemput
- 申请人： Francisco Juarez , Dennis Hausmann , Bunsen Nie , Teresa Pong , Adrianne Tipton , Patrick Van Cleemput
- 申请人地址： US CA San Jose
- 专利权人： Novellus Systems, Inc.
- 当前专利权人： Novellus Systems, Inc.
- 当前专利权人地址： US CA San Jose
- 代理机构： DeLio & Peterson, LLC
- 代理商 Peter W. Peterson
- 主分类号： C23C16/00
- IPC分类号： C23C16/00
摘要：
A method of depositing material on a substrate comprises providing a reactor with a reaction chamber having a first volume, and contacting a surface of a substrate in the reaction chamber with a first precursor at the first chamber volume to react with and deposit a first layer on the substrate. The method further includes enlarging the reaction chamber to a second, larger volume and removing undeposited first precursor and any excess reaction product to end reaction of the first precursor with the substrate.
信息查询
IPC分类:
