Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11330394Application Date: 2006-01-12
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Publication No.: US07705962B2Publication Date: 2010-04-27
- Inventor: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
- Applicant: Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Frits Van Der Meulen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03B27/32
Abstract:
A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted.
Public/Granted literature
- US20060158627A1 Lithographic apparatus and device manufacturing method Public/Granted day:2006-07-20
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