发明授权
- 专利标题： Imprint lithography
- 专利标题（中）： 印刷光刻
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申请号： US11185971申请日： 2005-07-21
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公开(公告)号： US07708924B2公开(公告)日： 2010-05-04
- 发明人: Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- 申请人： Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： B28B11/08
- IPC分类号： B28B11/08
摘要：
A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
公开/授权文献
- US20070018360A1 Imprint lithography 公开/授权日：2007-01-25