发明授权
- 专利标题: Thin film including multi components and method of forming the same
- 专利标题(中): 薄膜包括多组分及其形成方法
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申请号: US11176657申请日: 2005-07-08
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公开(公告)号: US07709377B2公开(公告)日: 2010-05-04
- 发明人: Jung-hyun Lee , Dae-sig Kim , Yo-sep Min , Young-jin Cho
- 申请人: Jung-hyun Lee , Dae-sig Kim , Yo-sep Min , Young-jin Cho
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR2001-24684 20010507; KR2002-23297 20020429
- 主分类号: H01L21/469
- IPC分类号: H01L21/469 ; H01L21/4763
摘要:
A thin film including multi components and a method of forming the thin film are provided, wherein a method according to an embodiment of the present invention, a substrate is loaded into a reaction chamber. A unit material layer is formed on the substrate. The unit material layer may be formed of a mosaic atomic layer composed of two kinds of precursors containing components constituting the thin film. The inside of the reaction chamber is purged, and the MAL is chemically changed. The method of forming the thin film of the present invention requires fewer steps than a conventional method while retaining the advantages of the conventional method, thereby allowing a superior thin film yield in the present invention than previously obtainable.