发明授权
- 专利标题: X-ray analysis apparatus
- 专利标题(中): X射线分析仪
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申请号: US11880638申请日: 2007-07-23
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公开(公告)号: US07711091B2公开(公告)日: 2010-05-04
- 发明人: Akito Sasaki , Aya Kuribayashi , Keiichi Morikawa , Kunio Nishi , Takao Ohara , Toshiyuki Kato , Yuji Tsuji
- 申请人: Akito Sasaki , Aya Kuribayashi , Keiichi Morikawa , Kunio Nishi , Takao Ohara , Toshiyuki Kato , Yuji Tsuji
- 申请人地址: JP Tokyo
- 专利权人: Rigaku Corporation
- 当前专利权人: Rigaku Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Frishauf, Holtz, Goodman & Chick, P.C.
- 优先权: JP2006-231728 20060829
- 主分类号: H05G1/58
- IPC分类号: H05G1/58 ; H05G1/00
摘要:
An X-ray analysis apparatus has information about a relationship between selection of a measurement type and a replacement work of optical parts and shows, on a screen of a display, graphical information about optical parts which should be changed, to make it easy for an operator to perform a preliminary work before measurement. When the operator selects one desired measurement type among a plurality of measurement types in a selection window, there is displayed on the display, depending on the selected measurement type, graphical information about necessary optical parts which should be newly installed and/or installed optical parts which should be removed. The operator looks at the operating instructions and then performs the replacement work. The graphical information may be: graphical indication of the installation locations of the optical parts; different pictorial expressions about the installation and the removal works; and graphical indication of the identification marks of the optical parts.
公开/授权文献
- US20080056452A1 X-ray analysis apparatus 公开/授权日:2008-03-06
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