发明授权
- 专利标题: Method for interlayer and yield based optical proximity correction
- 专利标题(中): 基于中间和屈服的光学邻近校正方法
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申请号: US11837033申请日: 2007-08-10
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公开(公告)号: US07712069B2公开(公告)日: 2010-05-04
- 发明人: Franz Xaver Zach
- 申请人: Franz Xaver Zach
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 John A. Jordan
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based upon distance values between layout features, such as, edge features. In comparing the edge points on the predicted layout pattern with the corresponding point on the design layout pattern, a yield test is first undertaken before movement of the points on the predicted layout pattern to a position of higher yield. Where yield is acceptable, no further movement is made. Where incremental movement of points results in coming within acceptable proximity before acceptable yield is reached, the point is flagged for further consideration.
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