发明授权
US07713450B2 Photocromic primer composition having high impact resistance and transparent material coated with the same
有权
具有高耐冲击性的光致发色底漆组合物和用其涂覆的透明材料
- 专利标题： Photocromic primer composition having high impact resistance and transparent material coated with the same
- 专利标题（中）： 具有高耐冲击性的光致发色底漆组合物和用其涂覆的透明材料
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申请号： US10566446申请日： 2004-08-06
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公开(公告)号： US07713450B2公开(公告)日： 2010-05-11
- 发明人: Sung Hyun Lim , Se Hui Han , Sung Hoon Jang
- 申请人： Sung Hyun Lim , Se Hui Han , Sung Hoon Jang
- 申请人地址： KR Seoul
- 专利权人： LG Chem. Ltd.
- 当前专利权人： LG Chem. Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： McKenna Long & Aldridge LLP
- 优先权： KR10-2003-0054390 20030806
- 国际申请： PCT/KR2004/001976 WO 20040806
- 国际公布： WO2005/014739 WO 20050217
- 主分类号： G02B5/23
- IPC分类号： G02B5/23 ; C08G18/02 ; C08G18/58
摘要：
Disclosed are a primer composition having photochromic property and impact resistance for coating transparent materials and a photochromic transparent material having a primer layer formed by coating and curing the primer composition. The primer composition for coating transparent materials comprises: a) 5-90 parts by weight of a polyurethane containing Brønsted salt; b) 5-50 parts by weight of a polyepoxy resin; and c) 140 parts by weight of a photochromic dye, based on 100 parts by weight of the total primer composition. The photochromic transparent material having a primer layer formed by coating and curing the primer composition shows excellent photochromic property and impact resistance.
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