Invention Grant
- Patent Title: Surface treatment method, manufacturing method of color filter substrate, and manufacturing method of electro-optical device
- Patent Title (中): 表面处理方法,滤色器基板的制造方法以及电光装置的制造方法
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Application No.: US11424957Application Date: 2006-06-19
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Publication No.: US07713593B2Publication Date: 2010-05-11
- Inventor: Kei Hiruma , Katsuhiro Takahashi
- Applicant: Kei Hiruma , Katsuhiro Takahashi
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2005-178969 20050620
- Main IPC: H05H1/22
- IPC: H05H1/22

Abstract:
A surface treatment method using a plasma treatment apparatus which has an electric discharge generation portion facing a surface of a substrate with a gap therebetween, the substrate being placed on a supporting body, and a construction in which the gap is supplied with a treatment gas, the method includes: applying different voltages between the electric discharge generation portion and the supporting body such that plasma is obtained from the treatment gas supplied to the gap; moving one of the electric discharge generation portion and the substrate relative to the other in a first direction, while the surface of the substrate being exposed to the plasma; and moving, after the relative movement in the first direction and the exposure above referenced, one of the electric discharge generation portion and the substrate relative to the other in a second direction opposite to the first direction, while the surface of the substrate being exposed to the plasma.
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Information query
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