Invention Grant
- Patent Title: Charged particle beam apparatus, aberration correction value calculation unit therefor, and aberration correction program therefor
- Patent Title (中): 带电粒子束装置,其像差校正值计算单元及其像差校正程序
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Application No.: US12121924Application Date: 2008-05-16
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Publication No.: US07714286B2Publication Date: 2010-05-11
- Inventor: Tomonori Nakano , Takeshi Kawasaki , Kotoko Hirose , Makoto Ezumi
- Applicant: Tomonori Nakano , Takeshi Kawasaki , Kotoko Hirose , Makoto Ezumi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-131518 20070517
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
A charged particle beam apparatus includes: a correction image acquisition part 52 for making a detector 20 acquire items of two-dimensional image data at different focal positions; a directional differentiation operation part 53 for obtaining directional derivative values in a plurality of directions for each of the items of two-dimensional image data at different focal positions; an aberration parameter calculation part 54 for obtaining aberration parameters according to previously determined methods by using the directional derivative values in a plurality of directions for each of the items of two-dimensional image data; an aberration correction value calculation part 55 for obtaining correction values for aberrations by using the aberration parameters; and a control part 56 for setting the correction values in a correction optical system control means to make an aberration corrector 16 correct the aberrations.
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