发明授权
- 专利标题： Fabricating a structure usable in an imprint lithographic process
- 专利标题（中）： 制造可用于压印光刻工艺的结构
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申请号： US11493478申请日： 2006-07-25
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公开(公告)号： US07718077B1公开(公告)日： 2010-05-18
- 发明人: Han-Jun Kim , Carl P. Taussig
- 申请人： Han-Jun Kim , Carl P. Taussig
- 申请人地址： US TX Houston
- 专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人： Hewlett-Packard Development Company, L.P.
- 当前专利权人地址： US TX Houston
- 主分类号： B44C1/22
- IPC分类号： B44C1/22
摘要：
A method of fabricating an article usable in an imprint lithographic process is disclosed. The method includes patterning masking material layers on a substrate thereby forming a multi-layer mask and sequentially removing portions of the substrate based on the multi-layer mask to thereby forming a structure usable in an imprint lithographic process.
信息查询
