发明授权
US07720655B2 Extended mainframe designs for semiconductor device manufacturing equipment 有权
用于半导体器件制造设备的扩展主机设计

Extended mainframe designs for semiconductor device manufacturing equipment
摘要:
In a first aspect, a first mainframe is provided for use during semiconductor device manufacturing. The first mainframe includes (1) a sidewall that defines a central transfer region adapted to house a robot; (2) a plurality of facets formed on the sidewall, each adapted to couple to a process chamber; and (3) an extended facet formed on the sidewall that allows the mainframe to be coupled to at least four full-sized process chambers while providing service access to the mainframe. Numerous other aspects are provided.
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