发明授权
- 专利标题: Anti-reflection film producing method and apparatus
- 专利标题(中): 防反射膜的制造方法和装置
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申请号: US11790165申请日: 2007-04-24
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公开(公告)号: US07722921B2公开(公告)日: 2010-05-25
- 发明人: Kazuhiro Shimoda , Hirokazu Nishimura , Makoto Satoh
- 申请人: Kazuhiro Shimoda , Hirokazu Nishimura , Makoto Satoh
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2006-122062 20060426
- 主分类号: B05D3/02
- IPC分类号: B05D3/02
摘要:
Anti-reflection film includes a transparent support, at least one optical functional layer overlaid on the support, and a low refractive index layer, overlaid on the optical functional layer, and having a lower refractive index than the optical functional layer. An anti-reflection film producing apparatus to produce this includes a coater for coating a surface of the optical functional layer with liquid for forming the low refractive index layer, to form a coating layer. A dryer promotes drying of the coating layer. A heater hardens the coating layer from the dryer at a first temperature level, and then hardens the coating layer at a second temperature level higher than the first temperature level, to form the low refractive index layer. Preferably, a difference between the first and second temperature levels is 1-50 deg. C. Also, ultraviolet rays are applied to the low refractive index layer after the hardening of the heater.
公开/授权文献
- US20070253062A1 Anti-reflection film producing method and apparatus 公开/授权日:2007-11-01
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