发明授权
- 专利标题： Electron beam processing for mask repair
- 专利标题（中）： 电子束处理面罩修复
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申请号： US10758966申请日： 2004-01-16
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公开(公告)号： US07727681B2公开(公告)日： 2010-06-01
- 发明人: Diane K. Stewart , J. David Casey, Jr. , John Beaty , Christian R. Musil , Steven Berger , Sybren J. Sijbrandij
- 申请人： Diane K. Stewart , J. David Casey, Jr. , Joan Williams Casey, legal representative , John Beaty , Christian R. Musil , Steven Berger , Sybren J. Sijbrandij
- 申请人地址： US OR Hillsboro
- 专利权人： FEI Company
- 当前专利权人： FEI Company
- 当前专利权人地址： US OR Hillsboro
- 代理机构： Scheinberg & Griner, LLP
- 代理商 David Griner; Michael O. Scheinberg
- 主分类号： B01J19/08
- IPC分类号： B01J19/08
摘要：
Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.
公开/授权文献
- US20040226814A1 Electron beam processing for mask repair 公开/授权日：2004-11-18
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