- 专利标题: Semiconductor memory device with three dimensional solid electrolyte structure, and manufacturing method thereof
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申请号: US11364182申请日: 2006-03-01
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公开(公告)号: US07732799B2公开(公告)日: 2010-06-08
- 发明人: Jung-hyun Lee , Kyu-sik Kim
- 申请人: Jung-hyun Lee , Kyu-sik Kim
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2005-0021844 20050316
- 主分类号: H01L47/00
- IPC分类号: H01L47/00
摘要:
The semiconductor memory device includes a variable resistance device having a solid electrolyte in a three-dimensional structure. The variable resistance device includes a first electrode; the solid electrolyte, which has at least two regions with different heights, formed on the first electrode; and a second electrode made of a conductive material formed on the solid electrolyte to cover the regions with different heights. In addition, a multibit semiconductor memory device is provided which includes a bias circuit that can control the intensity of a current and time the current is supplied to the variable resistance device inside a memory cell in multiple steps to configure multibits.
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