发明授权
US07736936B2 Method of forming display device that includes removing mask to form opening in insulating film
失效
一种形成显示装置的方法,包括去除掩模以在绝缘膜中形成开口
- 专利标题: Method of forming display device that includes removing mask to form opening in insulating film
- 专利标题(中): 一种形成显示装置的方法,包括去除掩模以在绝缘膜中形成开口
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申请号: US11889546申请日: 2007-08-14
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公开(公告)号: US07736936B2公开(公告)日: 2010-06-15
- 发明人: Koichiro Tanaka
- 申请人: Koichiro Tanaka
- 申请人地址: JP Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia
- 优先权: JP2006-231956 20060829
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
To improve the use efficiency of materials and provide a technique of fabricating a display device by a simple process. The method includes the steps of providing a mask on a conductive layer, forming an insulating film over the conductive layer provided with the mask, removing the mask to form an insulating layer having an opening; and forming a conductive film in the opening so as to be in contact with the exposed conductive layer, whereby the conductive layer and the conductive film can be electrically connected through the insulating layer. The shape of the opening reflects the shape of the mask. A mask having a columnar shape (e.g., a prism, a cylinder, or a triangular prism), a needle shape, or the like can be used.
公开/授权文献
- US20080057604A1 Method of fabricating display device 公开/授权日:2008-03-06
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