发明授权
- 专利标题： Debris mitigation system and lithographic apparatus
- 专利标题（中）： 碎片缓解系统和光刻设备
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申请号： US11645808申请日： 2006-12-27
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公开(公告)号： US07737418B2公开(公告)日： 2010-06-15
- 发明人: Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
- 申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.
公开/授权文献
- US20080159471A1 Debris mitigation system and lithographic apparatus 公开/授权日：2008-07-03
信息查询
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