Invention Grant
US07738721B2 Method and apparatus for modeling film grain patterns in the frequency domain
有权
用于在频域中建模胶片颗粒图案的方法和装置
- Patent Title: Method and apparatus for modeling film grain patterns in the frequency domain
- Patent Title (中): 用于在频域中建模胶片颗粒图案的方法和装置
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Application No.: US10569318Application Date: 2004-04-07
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Publication No.: US07738721B2Publication Date: 2010-06-15
- Inventor: Cristina Gomila , Joan Llach
- Applicant: Cristina Gomila , Joan Llach
- Applicant Address: FR Boulogne-Billancourt
- Assignee: Thomson Licensing
- Current Assignee: Thomson Licensing
- Current Assignee Address: FR Boulogne-Billancourt
- Agent Robert D. Shedd; Robert B. Levy
- International Application: PCT/US2004/010789 WO 20040407
- International Announcement: WO2005/027045 WO 20050324
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06K9/40 ; G06K9/38 ; G09G5/00 ; G06T15/50 ; G06T15/60 ; H04N5/262 ; H04N9/74
Abstract:
Film grain patterns can be modeled in the frequency domain by estimating the cut frequencies that define a 2D band-pass filter. The film grain parameters can be conveyed in accordance with the ITU-T H.264|MPEG-4 AVC standard in an SEI message allowing film grain reinsertion at a decoder.
Public/Granted literature
- US20060292837A1 Method and apparatus for modelling film grain patterns in the frequency domain Public/Granted day:2006-12-28
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