发明授权
- 专利标题： Developing apparatus and developing method
- 专利标题（中）： 开发设备和开发方法
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申请号： US11631514申请日： 2005-07-13
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公开(公告)号： US07740410B2公开(公告)日： 2010-06-22
- 发明人: Takanori Nishi , Takahiro Kitano , Katsuya Okumura
- 申请人： Takanori Nishi , Takahiro Kitano , Katsuya Okumura
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Tokyo Electron Limited,Octec Inc.
- 当前专利权人： Tokyo Electron Limited,Octec Inc.
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Smith, Gambrell & Russell, LLP
- 优先权： JP2004-208506 20040715
- 国际申请： PCT/JP2005/012957 WO 20050713
- 国际公布： WO2006/009046 WO 20060126
- 主分类号： G03B5/00
- IPC分类号： G03B5/00 ; G03B13/00
摘要：
A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to supply a developing solution to a substrate on a substrate holder, and a controller to control a heater, a cooler and a developing nozzle.
公开/授权文献
- US20080305434A1 Developing Apparatus and Developing Method 公开/授权日：2008-12-11