发明授权
- 专利标题: High frequency surface acoustic wave device and the substrate thereof
- 专利标题(中): 高频声表面波装置及其基板
-
申请号: US12232033申请日: 2008-09-10
-
公开(公告)号: US07741752B2公开(公告)日: 2010-06-22
- 发明人: Wen-Ching Shih , Hui-Min Wang
- 申请人: Wen-Ching Shih , Hui-Min Wang
- 申请人地址: TW Taipei
- 专利权人: Tatung Company & Tatung University
- 当前专利权人: Tatung Company & Tatung University
- 当前专利权人地址: TW Taipei
- 代理机构: Bacon & Thomas, PLLC
- 优先权: TW97130638A 20080812
- 主分类号: H03H9/25
- IPC分类号: H03H9/25
摘要:
A high frequency SAW device and the substrate thereof are disclosed. The disclosed high frequency SAW device does not need to use the conventional and expensive sapphire substrate as its substrate. Besides, the disclosed substrate for a high-frequency SAW device can replace the conventional sapphire substrate in the use of the substrate for a high frequency SAW device. The disclosed high frequency SAW device comprises: a substrate; a first buffering layer forming on the surface of the substrate; a second buffering layer forming on the surface of the first buffering layer; a piezoelectric layer forming on the surface of the second buffering layer; an input transformation unit; and an output transformation unit, wherein the input transformation unit and the output transformation unit are formed in pairs on the surface of or beneath the piezoelectric layer.
公开/授权文献
信息查询