发明授权
US07750327B2 Device for the generation of a gas curtain for plasma-based EUV radiation sources
有权
用于产生基于等离子体的EUV辐射源的气幕的装置
- 专利标题: Device for the generation of a gas curtain for plasma-based EUV radiation sources
- 专利标题(中): 用于产生基于等离子体的EUV辐射源的气幕的装置
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申请号: US12120536申请日: 2008-05-14
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公开(公告)号: US07750327B2公开(公告)日: 2010-07-06
- 发明人: Chinh Duc Tran , Jesko Brudermann , Bjoern Mader , Gilbert Dornieden , Thomas Brauner
- 申请人: Chinh Duc Tran , Jesko Brudermann , Bjoern Mader , Gilbert Dornieden , Thomas Brauner
- 申请人地址: DE Jena
- 专利权人: XTREME technologies GmbH
- 当前专利权人: XTREME technologies GmbH
- 当前专利权人地址: DE Jena
- 代理机构: Frommer Lawrence & Haug LLP
- 优先权: DE102007023444 20070516
- 主分类号: H04H1/04
- IPC分类号: H04H1/04
摘要:
The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.
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