发明授权
- 专利标题: Systems and methods for ray tracing
- 专利标题(中): 射线跟踪的系统和方法
-
申请号: US11564048申请日: 2006-11-28
-
公开(公告)号: US07751034B2公开(公告)日: 2010-07-06
- 发明人: Jose Sasian , Jason Quick , Jason Flatt
- 申请人: Jose Sasian , Jason Quick , Jason Flatt
- 申请人地址: US NV Las Vegas
- 专利权人: American Gem Society
- 当前专利权人: American Gem Society
- 当前专利权人地址: US NV Las Vegas
- 代理机构: Lewis, Rice & Fingerish, L.C.
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
Systems and methods for evaluating an optical property of a gemstone operate to trace selected and ordered model light rays through a model of the gemstone. The rays may be selected such that, when ordered into a sequence, the points of contact of successive rays with the gemstone surface generate a pattern defined by a path created by the linking of successive contact points with line segments. Further, the rays may be propagated through the gemstone in a manner that utilizes an ordered set of facet identifiers corresponding to facets impinged upon by a ray previously propagated through the gemstone. Moreover, these strategies can be combined by propagating an ordered sequence of rays corresponding to an ordered set of contact points generating a pattern defined by a path, and using for such propagation an ordered set of facet identifiers corresponding to facets impinged upon by a ray previously propagated through the gemstone.
公开/授权文献
- US20080123076A1 Systems and Methods for Ray Tracing 公开/授权日:2008-05-29
信息查询