发明授权
- 专利标题: Low reaction rate, high blast shaped charge waveshaper
- 专利标题(中): 低反应率,高爆炸形电荷波导
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申请号: US11858978申请日: 2007-09-21
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公开(公告)号: US07752972B1公开(公告)日: 2010-07-13
- 发明人: Ernest L. Baker , James D. Pham , Arthur S. Daniels
- 申请人: Ernest L. Baker , James D. Pham , Arthur S. Daniels
- 申请人地址: US DC Washington
- 专利权人: The United States of America as represented by the Secretary of the Army
- 当前专利权人: The United States of America as represented by the Secretary of the Army
- 当前专利权人地址: US DC Washington
- 代理商 Michael C. Sachs
- 主分类号: F42B1/02
- IPC分类号: F42B1/02
摘要:
A shaped charge warhead having a longitudinal axis includes a casing; a liner disposed in the casing; an explosive disposed behind the liner; a wave shaper disposed in the explosive, the wave shaper comprising a low reaction rate high blast reactive material; and a detonator disposed adjacent the explosive. Preferably, the wave shaper is symmetrical about the longitudinal axis. The low reaction rate, high-blast material may be, for example, one of powdered silicon or boron and powdered silicon or boron in a plastic matrix.