A mask with a focus measurement pattern and a method for measuring a focus value in an exposure process using the same that are capable of improving the measurement of a focus change, wherein the mask includes an outer reference pattern which provides a position reference for focus measurement, and focus measurement patterns which are provided apart from the outer reference pattern and formed in a line shape extending in two different directions. Accordingly, the focus change caused in the exposure process can be measured by measuring the line shortening of the focus measurement patterns.