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US07754516B2 Fabricating sub-lithographic contacts 失效
制造亚光刻接触

Fabricating sub-lithographic contacts
Abstract:
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.
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