Invention Grant
- Patent Title: Fabricating sub-lithographic contacts
- Patent Title (中): 制造亚光刻接触
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Application No.: US12287073Application Date: 2008-10-06
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Publication No.: US07754516B2Publication Date: 2010-07-13
- Inventor: Ming Jin , Ilya V. Karpov , Jinwook Lee , Narahari Ramanuja
- Applicant: Ming Jin , Ilya V. Karpov , Jinwook Lee , Narahari Ramanuja
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A small critical dimension element, such as a heater for an ovonic unified memory, may be formed within a pore by using successive sidewall spacers. The use of at least two successive spacers enables the limitations imposed by lithography and the limitations imposed by bread loafing to be overcome to provide reduced critical dimension elements.
Public/Granted literature
- US20090142927A1 Fabricating sub-lithographic contacts Public/Granted day:2009-06-04
Information query
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