发明授权
- 专利标题: Interband tunneling intersubband transition semiconductor laser
- 专利标题(中): 带间隧穿带内过渡半导体激光器
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申请号: US11952408申请日: 2007-12-07
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公开(公告)号: US07756176B2公开(公告)日: 2010-07-13
- 发明人: Gyungock Kim , In Gyoo Kim , Junghyung Pyo , Ki Seok Chang
- 申请人: Gyungock Kim , In Gyoo Kim , Junghyung Pyo , Ki Seok Chang
- 申请人地址: KR Daejeon
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon
- 代理机构: Ladas & Parry LLP
- 优先权: KR10-2006-0125065 20061208
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
An interband resonant tunneling intersubband transition laser is disclosed, and includes a semiconductor substrate, and a first cladding layer, an active region structure layer and a second cladding layer formed on the semiconductor substrate. The active region structure layer includes quantum well layers and quantum barrier layers that are alternately stacked and have a broken energy bandgap. Thus, the interband resonant tunneling intersubband transition laser operates in a cascade mode in which an intersubband radiative transition and interband tunneling of carriers consecutively and repetitively occur in the active region structure layer, and thus can achieve a high output from a simple, compact structure.
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