Invention Grant
- Patent Title: Interband tunneling intersubband transition semiconductor laser
- Patent Title (中): 带间隧穿带内过渡半导体激光器
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Application No.: US11952408Application Date: 2007-12-07
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Publication No.: US07756176B2Publication Date: 2010-07-13
- Inventor: Gyungock Kim , In Gyoo Kim , Junghyung Pyo , Ki Seok Chang
- Applicant: Gyungock Kim , In Gyoo Kim , Junghyung Pyo , Ki Seok Chang
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Ladas & Parry LLP
- Priority: KR10-2006-0125065 20061208
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
An interband resonant tunneling intersubband transition laser is disclosed, and includes a semiconductor substrate, and a first cladding layer, an active region structure layer and a second cladding layer formed on the semiconductor substrate. The active region structure layer includes quantum well layers and quantum barrier layers that are alternately stacked and have a broken energy bandgap. Thus, the interband resonant tunneling intersubband transition laser operates in a cascade mode in which an intersubband radiative transition and interband tunneling of carriers consecutively and repetitively occur in the active region structure layer, and thus can achieve a high output from a simple, compact structure.
Public/Granted literature
- US20080151956A1 INTERBAND TUNNELING INTERSUBBAND TRANSITION SEMICONDUCTOR LASER Public/Granted day:2008-06-26
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