发明授权
- 专利标题: Line narrowed laser apparatus
- 专利标题(中): 线窄激光设备
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申请号: US11453519申请日: 2006-06-15
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公开(公告)号: US07756183B2公开(公告)日: 2010-07-13
- 发明人: Osamu Wakabayashi , Takahito Kumazaki
- 申请人: Osamu Wakabayashi , Takahito Kumazaki
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Komatsu Ltd,Ushio Inc.
- 当前专利权人: Komatsu Ltd,Ushio Inc.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Husch Blackwell Sanders Welsh & Katz
- 优先权: JP2005-190368 20050629
- 主分类号: H01S3/09
- IPC分类号: H01S3/09 ; H01S3/10
摘要:
The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.
公开/授权文献
- US20070014326A1 Line narrowed laser apparatus 公开/授权日:2007-01-18
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