发明授权
- 专利标题: Technology migration for integrated circuits with radical design restrictions
- 专利标题(中): 具有激进设计限制的集成电路的技术迁移
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申请号: US11837732申请日: 2007-08-13
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公开(公告)号: US07761821B2公开(公告)日: 2010-07-20
- 发明人: Robert J. Allen , Cam V. Endicott , Fook-Luen Heng , Jason D. Hibbeler , Kevin W. McCullen , Rani Narayan , Robert F. Walker , Xin Yuan
- 申请人: Robert J. Allen , Cam V. Endicott , Fook-Luen Heng , Jason D. Hibbeler , Kevin W. McCullen , Rani Narayan , Robert F. Walker , Xin Yuan
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Hoffman Warnick LLC
- 代理商 Ryan K. Simmons
- 主分类号: G06F17/50
- IPC分类号: G06F17/50 ; G06F9/455
摘要:
A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.