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发明授权
US07763397B2 Photomask registration errors of which have been corrected and method of correcting registration errors of photomask 有权
已修正光掩模配准错误，修正光掩膜配准错误的方法

Photomask registration errors of which have been corrected and method of correcting registration errors of photomask
摘要：
Provided are photomask registration errors of which have been corrected and a method of correcting the registration errors of a photomask. The photomask includes a photomask substrate, an optical pattern formed on one surface of the photomask substrate, and a plurality of stress generation portions formed in the photomask substrate. A method of correcting the registration errors of a photomask includes the steps of forming an optical pattern on a photomask substrate, measuring the registration errors of the optical pattern, and forming a plurality of stress generation portions in the photomask substrate so that the stress generation portions correspond to the measured registration errors.
摘要（中）：

提供了其光掩模配准错误已被校正，以及校正光掩模的配准误差的方法。 光掩模包括光掩模基板，形成在光掩模基板的一个表面上的光学图案，以及形成在光掩模基板中的多个应力产生部。 校正光掩模的配准误差的方法包括以下步骤：在光掩模衬底上形成光学图案，测量光学图案的配准误差，以及在光掩模衬底中形成多个应力产生部分，使得应力产生部分 对应于测量的注册错误。

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