发明授权
- 专利标题: Gloss and differential gloss measuring system
- 专利标题(中): 光泽和差分光泽度测量系统
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申请号: US11783174申请日: 2007-04-06
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公开(公告)号: US07763876B2公开(公告)日: 2010-07-27
- 发明人: Martin E. Banton , Dale R. Mashtare , Paul A. Hosier
- 申请人: Martin E. Banton , Dale R. Mashtare , Paul A. Hosier
- 申请人地址: US CT Norwalk
- 专利权人: Xerox Corporation
- 当前专利权人: Xerox Corporation
- 当前专利权人地址: US CT Norwalk
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G01N21/86
- IPC分类号: G01N21/86
摘要:
A system is provided for measuring gloss and spatial dependence of gloss. In a first embodiment, the system comprises: a first illuminator configured to emit a first light beam at a point on a target, thereby producing a generally specular reflectance in a first direction; a second illuminator configured to emit a second light beam at the point on the target, thereby producing generally diffuse reflectance in the first direction; a linear array sensor configured to detect the generally specular reflectance and the generally diffuse reflectance in the first direction; and a processor configured to process the generally specular reflectance and the generally diffuse reflectance detected by the linear array sensor. In a second embodiment, the system comprises: an illuminator configured to emit a beam of light at a point on a target, thereby producing a generally specular reflectance in a first direction and generally diffuse reflectance in a second direction; a first linear array sensor configured to detect the generally specular reflectance in the first direction; a second linear array sensor configured to detect the generally diffuse reflectance in the second direction; and a processor configured to process the generally specular reflectance detected by the first linear array sensor and the generally diffuse reflectance detected by the second linear array sensor.
公开/授权文献
- US20080245979A1 Gloss and differential gloss measuring system 公开/授权日:2008-10-09
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