Invention Grant
- Patent Title: Method of forming shadow mask pattern
- Patent Title (中): 形成荫罩图案的方法
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Application No.: US11325312Application Date: 2006-01-05
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Publication No.: US07765669B2Publication Date: 2010-08-03
- Inventor: Jin Kyoo Kim , Sang Jin Han , Hee Cheol Kang , Eu Gene Kang , Tae Hyung Kim
- Applicant: Jin Kyoo Kim , Sang Jin Han , Hee Cheol Kang , Eu Gene Kang , Tae Hyung Kim
- Applicant Address: KR Yongin
- Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2005-0000960 20050105
- Main IPC: B23P11/02
- IPC: B23P11/02 ; H01L21/00
Abstract:
Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.
Public/Granted literature
- US20060158088A1 Method of forming shadow mask pattern Public/Granted day:2006-07-20
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