Invention Grant
US07767032B2 No-clean low-residue solder paste for semiconductor device applications
有权
用于半导体器件应用的无清洁低残留焊膏
- Patent Title: No-clean low-residue solder paste for semiconductor device applications
- Patent Title (中): 用于半导体器件应用的无清洁低残留焊膏
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Application No.: US11479374Application Date: 2006-06-30
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Publication No.: US07767032B2Publication Date: 2010-08-03
- Inventor: Quan Sheng , Muriel Thomas , Jens Nachreiner
- Applicant: Quan Sheng , Muriel Thomas , Jens Nachreiner
- Applicant Address: DE Hanau
- Assignee: W.C. Heraeus Holding GmbH
- Current Assignee: W.C. Heraeus Holding GmbH
- Current Assignee Address: DE Hanau
- Agency: Kalow & Springut LLP
- Agent William D. Schmidt
- Main IPC: B23K35/34
- IPC: B23K35/34

Abstract:
A no-clean low residue solder paste is described for die-attach dispensing or fine pitch printing of semiconductor devices. The solder paste has a homogeneous consistency with no tendency to paste separation. The ultimately remaining residue is clear and crystal like and is compatible with further processing steps without prior cleaning with a solvent to remove flux residue. The solder paste comprises a relatively low amount of rosin in combination with a viscous solvent system, thixotropic agents, activators, additives and optionally plasticizers.
Public/Granted literature
- US20080000549A1 No-clean low-residue solder paste for semiconductor device applications Public/Granted day:2008-01-03
Information query
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