Invention Grant
US07767107B2 Process for producing aluminum electrode foil for capacitor and aluminum foil for etching
有权
用于制造用于电容器的铝电极箔和用于蚀刻的铝箔的方法
- Patent Title: Process for producing aluminum electrode foil for capacitor and aluminum foil for etching
- Patent Title (中): 用于制造用于电容器的铝电极箔和用于蚀刻的铝箔的方法
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Application No.: US11631869Application Date: 2005-08-01
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Publication No.: US07767107B2Publication Date: 2010-08-03
- Inventor: Ayumi Kochi , Yuji Midou , Yukihiro Shimasaki , Hiroshi Fujii , Tatsuji Aoyama
- Applicant: Ayumi Kochi , Yuji Midou , Yukihiro Shimasaki , Hiroshi Fujii , Tatsuji Aoyama
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2004-229218 20040805
- International Application: PCT/JP2005/014021 WO 20050801
- International Announcement: WO2006/013812 WO 20060209
- Main IPC: C03C15/00
- IPC: C03C15/00 ; H01G9/00

Abstract:
A process for producing an aluminum electrode foil for a capacitor, which includes a first step of preparing an emulsion from a mixture including a first phase of a liquid resin or a resin solution obtained by dissolving a resin in a solvent, a second phase of a liquid that is incompatible with the first phase, and an emulsifier; a second step of coating the emulsion on a surface of an aluminum foil; a third step of removing the second phase to form a resin film having a plurality of pores on its surface; a fourth step of etching the aluminum foil having the resin film formed thereon; and a fifth step of removing the resin film after etching. The production process can form high-density etching pits with high accuracy.
Public/Granted literature
- US20070241077A1 Process for Producing Aluminum Electrode Foil for Capacitor and Aluminum Foil for Etching Public/Granted day:2007-10-18
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