Invention Grant
US07767253B2 Method of making a photovoltaic device with antireflective coating
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制造具有抗反射涂层的光伏器件的方法
- Patent Title: Method of making a photovoltaic device with antireflective coating
- Patent Title (中): 制造具有抗反射涂层的光伏器件的方法
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Application No.: US11716034Application Date: 2007-03-09
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Publication No.: US07767253B2Publication Date: 2010-08-03
- Inventor: Pramod K. Sharma
- Applicant: Pramod K. Sharma
- Applicant Address: US MI Auburn Hills
- Assignee: Guardian Industries Corp.
- Current Assignee: Guardian Industries Corp.
- Current Assignee Address: US MI Auburn Hills
- Agency: Nixon & Vanderhye P.C.
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H01L31/00

Abstract:
A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst, and water; forming a silica sol gel by mixing the polymeric component with a colloidal silica, and optionally a second solvent; forming a metal oxide sol by mixing silane(s) with a metal oxide, a second catalyst, and a third solvent; forming a combined sol by mixing the metal oxide sol with the silica sol; casting the mixture by spin coating or the like to form a silica and metal oxide containing layer on a substrate; and curing and/or heat treating the layer. This layer may make up all or only part of an anti-reflection coating which may be used in a photovoltaic device or the like.
Public/Granted literature
- US20080220152A1 Method of making a photovoltaic device with scratch-resistant coating and resulting product Public/Granted day:2008-09-11
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