发明授权
- 专利标题: Method of fabricating photomask blank
- 专利标题(中): 制造光掩模坯料的方法
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申请号: US11882729申请日: 2007-08-03
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公开(公告)号: US07767368B2公开(公告)日: 2010-08-03
- 发明人: Noriyasu Fukushima , Hiroki Yoshikawa
- 申请人: Noriyasu Fukushima , Hiroki Yoshikawa
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- 优先权: JP2006-259302 20060925
- 主分类号: G03F1/00
- IPC分类号: G03F1/00
摘要:
An opaque area is formed in a sidewall portion of a susceptor by stacking a material that is transparent to flash light and a material that is opaque to the flash light to form the sidewall portion or coating a surface of the opaque material with the transparent material. A top surface of the opaque area in the sidewall portion of the susceptor is designed to have a predetermined positional relationship with a top surface of a substrate; the top surface of the opaque area is set at the same position as that of the top surface of the substrate or higher than the top surface of the substrate by a predetermined height. Thus, obliquely incident flash light is absorbed or irregularly reflected by the opaque quartz portion, surrounding an excavated portion of the susceptor.
公开/授权文献
- US20080076040A1 Method of fabricating photomask blank 公开/授权日:2008-03-27
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