Invention Grant
- Patent Title: Photopolymerization type photosensitive lithographic printing plate precursor
- Patent Title (中): 光聚合型光敏平版印刷版前体
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Application No.: US11862494Application Date: 2007-09-27
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Publication No.: US07767380B2Publication Date: 2010-08-03
- Inventor: Noriaki Watanabe
- Applicant: Noriaki Watanabe
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-263214 20060927
- Main IPC: G03F7/11
- IPC: G03F7/11

Abstract:
A negative-working photopolymerization type photosensitive lithographic printing plate precursor capable of conducting image recording with laser, includes: a hydrophilic support; a photopolymerizable photosensitive layer containing (i) a sensitizing dye having an absorption maximum in a wavelength range of from 360 to 450 nm, (ii) a hexaarylbiimidazole compound and (iii) an addition polymerizable compound having an ethylenically unsaturated double bond; and a protective layer, in this order, wherein the protective layer has oxygen permeability at 25° C. under one atmosphere of from 25 ml/m2·day to 200 ml/m2·day.
Public/Granted literature
- US20080076066A1 PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR Public/Granted day:2008-03-27
Information query
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