Invention Grant
- Patent Title: Method for making a negative-working lithographic printing plate precursor
- Patent Title (中): 制造负性平版印刷版前体的方法
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Application No.: US11917800Application Date: 2005-11-24
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Publication No.: US07767384B2Publication Date: 2010-08-03
- Inventor: Joan Vermeersch , Marc Van Damme
- Applicant: Joan Vermeersch , Marc Van Damme
- Applicant Address: BE Mortsel
- Assignee: Agfa Graphics NV
- Current Assignee: Agfa Graphics NV
- Current Assignee Address: BE Mortsel
- Agency: Keating & Bennett, LLP
- Priority: EP05105378 20050617
- International Application: PCT/EP2005/056194 WO 20051124
- International Announcement: WO2006/133741 WO 20061221
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F7/00

Abstract:
A method for making a heat-sensitive negative-working lithographic printing plate precursor including the steps of providing a support having a hydrophilic surface or which is provided with a hydrophilic layer, and applying onto the support a coating solution including an infrared absorbing agent, hydrophobic thermoplastic polymer particles, a hydrophilic binder, and a polymer including siloxane and/or perfluoroalkyl monomeric units.
Public/Granted literature
- US20080199812A1 Method for Making a Negative-Working Lithographic Printing Plate Precusor Public/Granted day:2008-08-21
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