Invention Grant
- Patent Title: Methods for forming film patterns by disposing a liquid within a plural-level partition structure
- Patent Title (中): 通过在多层分隔结构内设置液体来形成膜图案的方法
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Application No.: US11689533Application Date: 2007-03-22
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Publication No.: US07767504B2Publication Date: 2010-08-03
- Inventor: Katsuyuki Moriya , Toshimitsu Hirai
- Applicant: Katsuyuki Moriya , Toshimitsu Hirai
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2006-115428 20060419
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A method for forming a film pattern by disposing a functional liquid in a pattern forming region partitioned by a bank includes: disposing a first bank forming material to a substrate so as to form a first bank layer; and forming a second bank layer on the first bank layer, wherein the first bank forming material is an organic material while the second bank layer is made of a fluorine resin material covering the first bank layer.
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