Invention Grant
- Patent Title: Semiconductor device, manufacturing method thereof, and manufacturing method of antenna
- Patent Title (中): 半导体装置及其制造方法以及天线的制造方法
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Application No.: US11920273Application Date: 2006-05-29
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Publication No.: US07767516B2Publication Date: 2010-08-03
- Inventor: Tomoyuki Aoki , Yuugo Goto
- Applicant: Tomoyuki Aoki , Yuugo Goto
- Applicant Address: unknown Atsugi-shi, Kangawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd
- Current Assignee Address: unknown Atsugi-shi, Kangawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2005-160192 20050531
- International Application: PCT/JP2006/311142 WO 20060529
- International Announcement: WO2006/129817 WO 20061207
- Main IPC: H01L21/8234
- IPC: H01L21/8234

Abstract:
An element group having a transistor is formed over a substrate and a conductive film to be a dummy pattern is formed over the element group by pushing out a paste including conductive particles from a first opening portion, and then a conductive film functioning as an antenna is formed continuously thereafter so as to electrically connect with the transistor, by pushing out a paste including conductive particles from a second opening portion. Therefore, an element group having a transistor, provided over a substrate; a first conductive film functioning as an antenna provided over the element group and is electrically connected to the transistor; a second conductive film to be a dummy pattern provided to be adjacent to the first conductive film and is not electrically connected to the transistor; are included.
Public/Granted literature
- US20090065588A1 Semiconductor Device, Manufacturing Method Thereof, and Manufacturing Method of Antenna Public/Granted day:2009-03-12
Information query
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